PRODUCTS

All Categories>

High Purity Chemicals

Capchem's high-purity ammonia, hydrogen peroxide, isopropyl alcohol, and sulfuric acid are the core materials for wet cleaning and etching processes. Their ultra-high purity (metal impurities at ppt level) and stability serve as the cornerstone for ensuring high yield and reliability of chips. These products are mainly used in the RCA cleaning process for integrated circuit silicon wafers, combined in specific ratios to formulate SC1, SC2, and SPM solutions, which remove metal impurities, organic residues, and particles.

Feature

  • High purity

  • Low metal impurities

  • Low organic impurities

  • Low particles

  • Controlled raw materials

  • Stable quality

  • Customized services

Application
  • 1

    Chip

  • 1

    Internet of Things

  • 1

    Smart home

  • 1

    Digital infrastructure

Product Series

NH₃·H₂O

NH₃·H₂O

NH₃·H₂O
H₂O₂

H₂O₂

H₂O₂。
H₂SO₄

H₂SO₄

H₂SO₄
IPA

IPA

IPA